• 文献标题:   Patterning monolayer graphene with zigzag edges on hexagonal boron nitride by anisotropic etching
  • 文献类型:   Article
  • 作  者:   WANG GL, WU S, ZHANG TT, CHEN P, LU XB, WANG SP, WANG DM, WATANABE K, TANIGUCHI T, SHI DX, YANG R, ZHANG GY
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   11
  • DOI:   10.1063/1.4959963
  • 出版年:   2016

▎ 摘  要

Graphene nanostructures are potential building blocks for nanoelectronic and spintronic devices. However, the production of monolayer graphene nanostructures with well-defined zigzag edges remains a challenge. In this paper, we report the patterning of monolayer graphene nanostructures with zigzag edges on hexagonal boron nitride (h-BN) substrates by an anisotropic etching technique. We found that hydrogen plasma etching of monolayer graphene on h-BN is highly anisotropic due to the inert and ultra-flat nature of the h-BN surface, resulting in zigzag edge formation. The as-fabricated zigzag-edged monolayer graphene nanoribbons (Z-GNRs) with widths below 30 nm show high carrier mobility and width-dependent energy gaps at liquid helium temperature. These high quality Z-GNRs are thus ideal structures for exploring their valleytronic or spintronic properties. Published by AIP Publishing.