• 文献标题:   Graphene nanopatterning by Quantum Optical Lithography
  • 文献类型:   Article
  • 作  者:   PAVEL E, MARINESCU V, LUNGULESCU M
  • 作者关键词:   graphene, optical nanopatterning, quantum optical lithography, nanoablation, sem, raman characterization
  • 出版物名称:   OPTIK
  • ISSN:   0030-4026 EI 1618-1336
  • 通讯作者地址:   Storex Technol
  • 被引频次:   0
  • DOI:   10.1016/j.ijleo.2019.163532
  • 出版年:   2020

▎ 摘  要

We have investigated the optical nanopatterning of trilayer graphene. Multiple 20 nm parallel lines were written by Quantum Optical Lithography. Partial and complete nanoablation have been studied. The electrons emission from nanosized area of the resist has produced nanoablation. The writing method could be applied to prototype nanodevice with different 2D materials.