• 文献标题:   Analysis of heat dissipation of epitaxial graphene devices on SiC
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   LEE K, MOON JS, OH T, KIM S, ASBECK P
  • 作者关键词:   graphene, selfheating, heat dissipation, interface resistance, 3d thermal simulation, temperature dependent pulsed iv
  • 出版物名称:   SOLIDSTATE ELECTRONICS
  • ISSN:   0038-1101 EI 1879-2405
  • 通讯作者地址:   Univ Calif San Diego
  • 被引频次:   5
  • DOI:   10.1016/j.sse.2014.06.014
  • 出版年:   2014

▎ 摘  要

A three-dimensional thermal simulation for analysis of heat dissipation of graphene resistors on silicon carbide substrates is presented. We investigate the effect of parameters such as graphene-substrate interface thermal resistance, device size and source-to-drain contact spacing, to quantify lateral as well as vertical heat spreading. Pulsed I-V measurements were performed at different temperatures and pulse widths to extract device thermal resistance for comparison with simulation results. Due to small heat capacitance of the device, self-heating occurs even at the shortest pulse time of 200 ns. The effective thermal resistance of epitaxial graphene resistors on SiC was estimated as 8 x 10(-5) K cm(2) W-1, by comparison between measurement and simulation results. (C) 2014 Elsevier Ltd. All rights reserved.