• 文献标题:   Band-Bending at the Graphene-SiC Interfaces: Effect of the Substrate
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   CHEN W, CHEN S, NI ZH, HUANG H, QI DC, GAO XY, SHEN ZX, WEE ATS
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922
  • 通讯作者地址:   Natl Univ Singapore
  • 被引频次:   10
  • DOI:   10.1143/JJAP.49.01AH05
  • 出版年:   2010

▎ 摘  要

In-situ synchrotron-based photoemission spectroscopy, low-temperature scanning tunneling microscopy and Raman spectroscopy are used to investigate the interface properties of graphene on both the (0001) and (000 (1) over bar) 6H-SiC (Si-and C-terminated surfaces). We clearly observe the upward band-bending upon the formation of interfacial graphene, which depends on the surface polarity of the underlying SiC substrate, i.e., a weak upward band bending by 0.4 eV forms on the Si-terminated 6H-SiC(0001); while a much larger upward band bending by 1.3 eV appears on the C-terminated 6H-SiC(000 (1) over bar). (C) 2010 The Japan Society of Applied Physics