• 文献标题:   Monitoring and analyses of substrate surface in first stages of graphene growth in plasma-enhanced chemical vapor deposition
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   KAWANO M, YAMADA S, HAYASHI Y
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Kyoto Inst Technol
  • 被引频次:   0
  • DOI:   10.7567/JJAP.55.06HC04
  • 出版年:   2016

▎ 摘  要

In situ ellipsometry was carried out as well as ex situ measurements by scanning electron microscopy and Raman spectroscopy for the analyses of substrate surface in the first stage of graphene growth in plasma-enhanced chemical vapor deposition. Evolutions of the ellipsometric parameters psi and Delta were precisely measured during the growth of graphene with the sensitivity far less than 1 nm in film thickness. By the fitting of the experimentally obtained trajectory of ellipsometric parameters on the psi-Delta coordinate plane to that of the calculated ones, we confirmed that the graphite volume fraction decreased with growth after a dense graphite material initially formed. This suggests that carbon nanowalls grew on a thin graphitic layer. (C) 2016 The Japan Society of Applied Physics