• 文献标题:   CVD Growth of Graphene Stacks on 4H-SiC (0001) Surface - X-ray Diffraction and Raman Spectroscopy Study
  • 文献类型:   Article
  • 作  者:   TOKARCZYK M, KOWALSKI G, GRODECKI K, URBAN J, STRUPINSKI W
  • 作者关键词:  
  • 出版物名称:   ACTA PHYSICA POLONICA A
  • ISSN:   0587-4246
  • 通讯作者地址:   Univ Warsaw
  • 被引频次:   3
  • DOI:  
  • 出版年:   2013

▎ 摘  要

Features associated with short and prolonged growth time in the chemical vapor deposition process of growth of graphene stacks on SiC (0001) substrate are reported. In particular general bimodal (as far as d(002) interlayer spacing is concerned) distribution of graphene species across the surface of the samples is observed. It consists of thin few layer graphene coverage of most of the sample surface accompanied by thick graphite-like island distribution. It points to the two independent channels of graphene stacks growth with two characteristic growth rates.