▎ 摘　　要

Heated up in H-2 and N-2 respectively at the heating-up stage, the copper foils were used as the substrates to fabricate graphene by low pressure chemical vapor deposition. The fabricated graphene presented different characteristics. Heated up in H-2, on the substrate appeared polycrystalline films with small domains of poor quality; while in N-2, the size of the graphene domain was up to 500 mu m with good quality. The results indicated that the heating-up atmosphere caused the differences in graphene morphology by changing the surface microstructure of the substrate. In N-2, the copper surface tended to become smoother, leading to difficult nucleation; while in H-2, plenty of terraced steps appeared on the surface of the substrate, providing much more favorable sites for active carbon atoms to cluster and nucleate.