• 文献标题:   Gate-Tunable Graphene-WSe2 Heterojunctions at the Schottky-Mott Limit
  • 文献类型:   Article
  • 作  者:   LAGASSE SW, DHAKRAS P, WATANABE K, TANIGUCHI T, LEE JU
  • 作者关键词:   2d material, fermi level pinning, graphene, schottky junction, schottkymott limit, van der waals heterostructure
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   SUNY Albany
  • 被引频次:   14
  • DOI:   10.1002/adma.201901392
  • 出版年:   2019

▎ 摘  要

Metal-semiconductor interfaces, known as Schottky junctions, have long been hindered by defects and impurities. Such imperfections dominate the electrical characteristics of the junction by pinning the metal Fermi energy. Here, a graphene-WSe2 p-type Schottky junction, which exhibits a lack of Fermi level pinning, is studied. The Schottky junction displays near-ideal diode characteristics with large gate tunability and small leakage currents. Using a gate electrostatically coupled to the WSe2 channel to tune the Schottky barrier height, the Schottky-Mott limit is probed in a single device. As a special manifestation of the tunable Schottky barrier, a diode with a dynamically controlled ideality factor is demonstrated.