• 文献标题:   Evaluation of the effective work-function of monolayer graphene on silicon dioxide by internal photoemission spectroscopy
  • 文献类型:   Article
  • 作  者:   TREPALIN V, ASSELBERGHS I, BREMS S, HUYGHEBAERT C, RADU I, AFANAS EV V, HOUSSA M, STESMANS A
  • 作者关键词:   graphene, internal photoemission, interface barrier, effective work function, uncapped graphene
  • 出版物名称:   THIN SOLID FILMS
  • ISSN:   0040-6090
  • 通讯作者地址:   Katholieke Univ Leuven
  • 被引频次:   1
  • DOI:   10.1016/j.tsf.2019.01.036
  • 出版年:   2019

▎ 摘  要

Internal photoemission of electrons from uncapped monolayer graphene to insulating SiO2 has been observed in samples prepared by water-intercalation based graphene transfer. The barrier height between the graphene Fermi level and the oxide conduction band bottom was reproducibly found to be 4.1-4.2 eV. Moreover, this value was weakly sensitive to the contacting metal work function (Al, Cu, Au). This barrier height corresponds to an effective work function of graphene close to 5.0 eV, which is nearly 0.5 eV higher than the usually reported vacuum value.