▎ 摘　　要

The colors of thin and thick layers of graphene and graphene oxide films on either SiO2 or Si3N4 grown silicon substrates were generated by a theoretical calculation procedure. The effects of the thicknesses of the material and the dielectric layers on the visibility of the graphene-based materials were investigated. The theoretical investigation was supplemented by measurements of the thicknesses of the material layers using either an atomic force microscope or a profilometer, depending on the thickness range. By combining the color calculation procedure with the measured thickness profiles, optical images of graphene-based materials on dielectric substrates can be reconstructed. The reconstructed image corresponds well to the real microscope image, which suggests that the image reconstruction procedure is a convenient way to investigate colors and determine the thickness of graphene-based materials. (C) 2013 Society of Photo-Optical Instrumentation Engineers (SPIE) [DOI: 10.1117/1.OE.52.2.023601]