• 文献标题:   Ambient Condition Production of High Quality Reduced Graphene Oxide
  • 文献类型:   Article
  • 作  者:   EVLASHIN SA, SVYAKHOVSKIY SE, FEDOROV FS, MANKELEVICH YA, DYAKONOV PV, MINAEV NV, DAGESYAN SA, MASLAKOV KI, KHMELNITSKY RA, SUETIN NV, AKHATOV IS, NASIBULIN AG
  • 作者关键词:   gas sensor, graphene oxide reduction, laser reduction
  • 出版物名称:   ADVANCED MATERIALS INTERFACES
  • ISSN:   2196-7350
  • 通讯作者地址:   Skolkovo Inst Sci Technol
  • 被引频次:   4
  • DOI:   10.1002/admi.201800737
  • 出版年:   2018

▎ 摘  要

Reduced graphene oxide (GO) becomes one of the most popular materials for applications in various optical, electronic, and sensor devices. Even though many methods are already reported for reduced graphene oxide synthesis, they usually raise issues related to their efficiency, quality, and environmental impact. This work demonstrates a simple, environmental friendly, and effective method for reducing graphene oxide under ambient conditions using nanosecond infrared laser irradiation. As a result, a Raman band intensity ratio of I(G)/I(D) of 4.59 is achieved with an average crystallite size of approximate to 90 nm. This graphene is of higher quality than what can be achieved with most of the existing methods. Additionally, the demonstrated reduction technique allows the selective reduction of graphene oxide and control the amount of functional groups on the surface of the material. Gas sensors fabricated according to the proposed technique efficiently detect NO2, NH3, and H2S with the sensitivity down to 10 ppm.