• 文献标题:   Quantum resistance metrology in graphene
  • 文献类型:   Article
  • 作  者:   GIESBERS AJM, RIETVELD G, HOUTZAGER E, ZEITLER U, YANG R, NOVOSELOV KS, GEIM AK, MAAN JC
  • 作者关键词:   carbon, contact resistance, nanostructured material, quantum hall effect
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Radboud Univ Nijmegen
  • 被引频次:   56
  • DOI:   10.1063/1.3043426
  • 出版年:   2008

▎ 摘  要

We performed a metrological characterization of the quantum Hall resistance in a 1 mu m wide graphene Hall bar. The longitudinal resistivity in the center of the nu=+/- 2 quantum Hall plateaus vanishes within the measurement noise of 20 m Omega up to 2 mu A. Our results show that the quantization of these plateaus is within the experimental uncertainty (15 ppm for 1.5 mu A current) equal to that in conventional semiconductors. The principal limitation of the present experiments is the relatively high contact resistances in the quantum Hall regime, leading to a significantly increased noise across the voltage contacts and a heating of the sample when a high current is applied.