• 文献标题:   Controlled growth of a line defect in graphene and implications for gate-tunable valley filtering
  • 文献类型:   Article
  • 作  者:   CHEN JH, AUTES G, ALEM N, GARGIULO F, GAUTAM A, LINCK M, KISIELOWSKI C, YAZYEV OV, LOUIE SG, ZETTL A
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   71
  • DOI:   10.1103/PhysRevB.89.121407
  • 出版年:   2014

▎ 摘  要

Atomically precise tailoring of graphene can enable unusual transport pathways and new nanometer-scale functional devices. Here we describe a recipe for the controlled production of highly regular "5-5-8" line defects in graphene by means of simultaneous electron irradiation and Joule heating by applied electric current. High-resolution transmission electron microscopy reveals individual steps of the growth process. Extending earlier theoretical work suggesting valley-discriminating capabilities of a graphene 5-5-8 line defect, we perform first-principles calculations of transport and find a strong energy dependence of valley polarization of the charge carriers across the defect. These findings inspire us to propose a compact electrostatically gated "valley valve" device, a critical component for valleytronics.