• 文献标题:   Graphene-Side-Gate Engineering
  • 文献类型:   Article
  • 作  者:   CHEN CT, LOW T, CHIU HY, ZHU WJ
  • 作者关键词:   electrostatic, graphene fieldeffect transistor fet, side gate
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   IBM TJ Watson Res Ctr
  • 被引频次:   11
  • DOI:   10.1109/LED.2011.2180355
  • 出版年:   2012

▎ 摘  要

Various mesoscopic devices exploit electrostatic side gates for their operation. In this letter, we investigate how voltage biasing of graphene side gates modulates the electrical transport characteristics of a graphene channel. We explore myriads of typical side-gated devices such as symmetric dual-side gates and asymmetric single-side gates, in monolayer and bilayer graphene. The side gates modulate the electrostatic doping in the graphene channel whose effect is reflected in transport measurement. This modulation efficiency is systematically characterized for all our devices and agrees well with the modeling presented.