• 文献标题:   Doping suppression and mobility enhancement of graphene transistors fabricated using an adhesion promoting dry transfer process
  • 文献类型:   Article
  • 作  者:   SHIN WC, YOON T, MUN JH, KIM TY, CHOI SY, KIM TS, CHO BJ
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Korea Adv Inst Sci Technol
  • 被引频次:   10
  • DOI:   10.1063/1.4846317
  • 出版年:   2013

▎ 摘  要

We present the facile dry transfer of graphene synthesized via chemical vapor deposition on copper film to a functional device substrate. High quality uniform dry transfer of graphene to oxidized silicon substrate was achieved by exploiting the beneficial features of a poly(4-vinylphenol) adhesive layer involving a strong adhesion energy to graphene and negligible influence on the electronic and structural properties of graphene. The graphene field effect transistors (FETs) fabricated using the dry transfer process exhibit excellent electrical performance in terms of high FET mobility and low intrinsic doping level, which proves the feasibility of our approach in graphene-based nanoelectronics. (C) 2013 AIP Publishing LLC.