• 文献标题:   Fabrication of graphene-like carbon films on 6H-SiC substrates via chlorination-annealing at low temperature
  • 文献类型:   Article
  • 作  者:   HU YF, GUO LX, DOU WT, CHONG LY, GUO H, ZHANG YM
  • 作者关键词:  
  • 出版物名称:   AIP ADVANCES
  • ISSN:   2158-3226
  • 通讯作者地址:   Xidian Univ
  • 被引频次:   0
  • DOI:   10.1063/1.5052520
  • 出版年:   2019

▎ 摘  要

Graphene-like carbon films have been fabricated by annealing carbide-derived carbons on 6H-SiC (0001) at lower temperature in Ar ambience. Those films show a moderate interaction with substrates and an ordered stacking along c-axis and exhibit the same Raman spectra as that of epitaxial graphene on SiC. This carbon film growth process developed here will provide a new approach to obtain graphene epitaxially grown on SiC substrate at lower cost compared with the traditional access. (c) 2019 Author(s).