• 文献标题:   Extended line defects in BN, GaN, and AlN semiconductor materials: Graphene-like structures
  • 文献类型:   Article
  • 作  者:   CAMACHOMOJICA DC, LOPEZURIAS F
  • 作者关键词:   boron nitride, aluminum nitride, gallium nitride, graphenelike, abinitio, defect, iiiv material
  • 出版物名称:   CHEMICAL PHYSICS LETTERS
  • ISSN:   0009-2614 EI 1873-4448
  • 通讯作者地址:   IPICYT
  • 被引频次:   6
  • DOI:   10.1016/j.cplett.2016.04.045
  • 出版年:   2016

▎ 摘  要

The extended line defect (ELD) mimicking grain boundaries in two-dimensional systems is theoretically investigated in BN, GaN, and AlN semiconductor materials with a single layer honeycomb structure. The ELD consists of octagonal-square membered rings. Density functional calculations of the electronic density of states, scanning tunneling microscopy and transmission electron microscopy image simulations are analyzed. Our results revealed that the ELDs are stable in all considered monolayers. In addition, electronic density of states calculations demonstrated that in gap states are emerged when ELD is incorporated into the honeycomb structures. Finally, results on armchair nanoribbons with bare-edges and hydrogenated edges are discussed. (C) 2016 Elsevier B.V. All rights reserved.