• 文献标题:   High spatial resolution ellipsometer for characterization of epitaxial graphene
  • 文献类型:   Article
  • 作  者:   GASKELL PE, SKULASON HS, STRUPINSKI W, SZKOPEK T
  • 作者关键词:  
  • 出版物名称:   OPTICS LETTERS
  • ISSN:   0146-9592
  • 通讯作者地址:   McGill Univ
  • 被引频次:   14
  • DOI:   10.1364/OL.35.003336
  • 出版年:   2010

▎ 摘  要

An ellipsometer with 3 mu m x 5 mu m spot size constructed with a single focusing and imaging element is used to measure the layer number of exfoliated graphene on glass and expitaxial graphene on SiC. Ellipsometric sensitivity to graphene layer number increases with decreasing layer number and decreasing substrate refractive index. Single-atomic-layer sensitivity has been achieved. High spatial resolution imaging and ellipsometry is useful for rapid characterization of epitaxially grown graphene films. (C) 2010 Optical Society of America