• 文献标题:   Growth of continuous graphene by open roll-to-roll chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   ZHONG GF, WU XY, D ARSIE L, TEO KBK, RUPESINGHE NL, JOUVRAY A, ROBERTSON J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Cambridge
  • 被引频次:   18
  • DOI:   10.1063/1.4967010
  • 出版年:   2016

▎ 摘  要

We demonstrate the growth of high-quality, continuous monolayer graphene on Cu foils using an open roll-to-roll (R2R) chemical vapor deposition (CVD) reactor with both static and moving foil growth conditions. N-2 instead of Ar was used as carrier gas to reduce process cost, and the concentrations of H-2 and CH4 reactants were kept below the lower explosive limit to ensure process safety for reactor ends open to ambient. The carrier mobility of graphene deposited at a Cu foil winding speed of 5 mm/min was 5270-6040 cm(2) V-1 s(-1) at room temperature (on 50 mu m x 50 mu m Hall devices). These results will enable the inline integration of graphene CVD for industrial R2R production. Published by AIP Publishing.