• 文献标题:   Double Contacts for Improved Performance of Graphene Transistors
  • 文献类型:   Article
  • 作  者:   FRANKLIN AD, HAN SJ, BOL AA, PEREBEINOS V
  • 作者关键词:   contact geometry, contact resistance, double contact, fieldeffect transistor, graphene
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   IBM TJ Watson Res Ctr
  • 被引频次:   61
  • DOI:   10.1109/LED.2011.2173154
  • 出版年:   2012

▎ 摘  要

A new double-contact geometry for graphene devices is studied and compared to traditional top contacts. Double contacts consist of metal below and above the graphene in a sandwich-type configuration. Four-probe structures were tested for both single-layer [chemical-vapor-deposition (CVD)-grown] graphene and bilayer (mechanically exfoliated) graphene, with both showing a decrease in contact resistance of at least 40% and an increase in transconductance greater than 20%. CVD-grown single-layer graphene transistors exhibited contact resistance as low as 260 Omega . mu m, with an average of 320 Omega . mu m. This new geometry can help minimize the impact of contacts on graphene device performance.