• 文献标题:   Focused-ion-beam-assisted selective control of graphene layers: acquisition of clean-cut ultra thin graphitic film
  • 文献类型:   Article
  • 作  者:   LEE KM, NEOGI A, PEREZ JM, CHOI TY
  • 作者关键词:  
  • 出版物名称:   NANOTECHNOLOGY
  • ISSN:   0957-4484
  • 通讯作者地址:   Univ N Texas
  • 被引频次:   3
  • DOI:   10.1088/0957-4484/21/20/205303
  • 出版年:   2010

▎ 摘  要

A focused-ion beam (FIB) and a nanomanipulator provide a novel way to selectively control and obtain a few layers of graphene. Because of its weak van der Waals force in the interlayer of graphite, the nanomanipulator could easily exfoliate a graphitic thin layer with no wrinkles on the surface from a highly oriented pyrolitic graphite (HOPG) by applying a shear force which exceeds the static interlayer shear force. Subsequently, a few layers of graphene were successfully obtained by applying a uniform shear force from a detached graphitic thin layer that had been transferred to a pre-determined site on an oxide wafer. The required shear force for clean cleavage of a graphitic thin layer was then estimated based upon experimental data. Raman scattering analysis was used to confirm the number of placed graphene layers and the placement of a few layers of graphene was projected to have about five atomic layers.