• 文献标题:   Improving Zr0.5Hf0.5O2-based charge-trapped performance by graphene oxide quantum dots
  • 文献类型:   Article
  • 作  者:   WANG H, DING BF, TIAN XY, ZHAO R, ZHANG YY, LU C, REN DL, YAN XB
  • 作者关键词:   chargetrapping memory, goqd, high retention
  • 出版物名称:   FUNCTIONAL MATERIALS LETTERS
  • ISSN:   1793-6047 EI 1793-7213
  • 通讯作者地址:   Hebei Univ
  • 被引频次:   0
  • DOI:   10.1142/S1793604718500935
  • 出版年:   2019

▎ 摘  要

In this work, graphene oxide quantum dots (GOQDs) are introduced as an electron-trapped layer in Pd/Zr0.5Hf0.5O2 (ZHO)/SiO2/Si memory device. This structure possessed longer than 10(4) s retention capability, a low operation voltage around +/- 10 V and 2.61 V storage windows. GOQDs contained carbon-carbon and carbon-oxygen single/double bonds based on the analysis of C-1s and O-1s X-ray photoelectron spectra. It is proposed that the GOQDs' wide bandgap with many oxygen-containing functional groups favors charge capture to a greater extent. This new type of charge-trapping memory can be a promising candidate for wide application to storing information with non-volatility in the big data era.