• 文献标题:   Controlled Chlorine Plasma Reaction for Noninvasive Graphene Doping
  • 文献类型:   Article
  • 作  者:   WU J, XIE LM, LI YG, WANG HL, OUYANG YJ, GUO J, DAI HJ
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
  • ISSN:   0002-7863
  • 通讯作者地址:   Stanford Univ
  • 被引频次:   160
  • DOI:   10.1021/ja2091068
  • 出版年:   2011

▎ 摘  要

We investigated the chlorine plasma reaction with graphene and graphene nanoribbons and compared it with the hydrogen and fluorine plasma reactions. Unlike the rapid destruction of graphene by hydrogen and fluorine plasmas, much slower reaction kinetics between the chlorine plasma and graphene were observed, allowing for controlled chlorination. Electrical measurements on graphene sheets, graphene nanoribbons, and large graphene films grown by chemical vapor deposition showed p-type doping accompanied by a conductance increase, suggesting nondestructive doping via chlorination. Ab initio simulations were performed to rationalize the differences in fluorine, hydrogen, and chlorine functionalization of graphene.