• 文献标题:   Surface Energy Modification by Spin-Cast, Large-Area Graphene Film for Block Copolymer Lithography
  • 文献类型:   Article
  • 作  者:   KIM BH, KIM JY, JEONG SJ, HWANG JO, LEE DH, SHIN DO, CHOI SY, KIM SO
  • 作者关键词:   block copolymer, selfassembly, graphene, nanolithography, surface energy modification
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Korea Adv Inst Sci Technol
  • 被引频次:   88
  • DOI:   10.1021/nn101491g
  • 出版年:   2010

▎ 摘  要

We demonstrate a surface energy modification method exploiting graphene film, Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene.