• 文献标题:   Quantifying ion-induced defects and Raman relaxation length in graphene
  • 文献类型:   Article
  • 作  者:   LUCCHESE MM, STAVALE F, FERREIRA EHM, VILANI C, MOUTINHO MVO, CAPAZ RB, ACHETE CA, JORIO A
  • 作者关键词:  
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:   Univ Fed Minas Gerais
  • 被引频次:   880
  • DOI:   10.1016/j.carbon.2009.12.057
  • 出版年:   2010

▎ 摘  要

Raman scattering is used to study disorder in graphene subjected to low energy (90 eV) Ar' ion bombardment The evolution of the intensity ratio between the G band (1585 cm(-1)) and the disorder-induced D band (1345 cm(-1)) with ion dose is determined, providing a spectroscopy-based method to quantify the density of defects in graphene This evolution can be fitted by a phenomenological model, which is in conceptual agreement with a well-established amorphization. trajectory for graphitic materials Our results show that the broadly used Tuinstra-Koenig relation should be limited to the measure of crystallite sizes, and allows extraction of the Raman relaxation length for the disorder-induced Raman scattering process (C) 2010 Elsevier Ltd All rights reserved