▎ 摘　　要

We propose a scheme to overcome diffraction limit in optical lithography via graphene-plasmon (GP) interference. Taking advantage of the novel properties of GPs-tunability, low loss, and extremely large wave number-we can realize lithography with a resolution up to 1/100 wavelength in arbitrary one-and even simple two-dimensional patterns. An advantage of this method is that it works in the linear optics regime and does not require either multiphoton absorption materials or strong intensity lasers.