• 文献标题:   Fabrication and electrical characteristics of graphene-based charge-trap memory devices
  • 文献类型:   Article
  • 作  者:   LEE S, KIM SM, SONG EB, WANG KL, SEO DH, SEO S
  • 作者关键词:   graphene, nonvolatile memory, chargetrap memory, fieldeffect transistor
  • 出版物名称:   JOURNAL OF THE KOREAN PHYSICAL SOCIETY
  • ISSN:   0374-4884 EI 1976-8524
  • 通讯作者地址:   Dongguk Univ Seoul
  • 被引频次:   7
  • DOI:   10.3938/jkps.61.108
  • 出版年:   2012

▎ 摘  要

Graphene-based non-volatile charge-trap memory devices were fabricated and characterized to investigate the implementation effect of both 2-dimensional graphene and the 3-dimensional memory structure. The single-layer-graphene (SLG) channel devices exhibit larger memory windows compared to the multi-layer-graphene (MLG) channel devices. This originates from the gate-coupling strength being larger in SLG devices than in MLG devices. Namely, the electrostatic charge screening effect becomes enhanced upon increasing the number of graphene layers; therefore, the gate tunability is reduced in MLG compared to SLG. The results suggest that SLG is more desirable for memory applications than MLG.