• 文献标题:   Preventing Thin Film Dewetting via Graphene Capping
  • 文献类型:   Article
  • 作  者:   CAO PG, BAI P, OMRANI AA, XIAO YH, MEAKER KL, TSAI HZ, YAN AM, JUNG HS, KHAJEH R, RODGERS GF, KIM Y, AIKAWA AS, KOLACZKOWSKI MA, LIU Y, ZETTL A, XU K, CROMMIE MF, XU T
  • 作者关键词:   antidewetting, graphene, metallic thin film, polymeric thin film
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   Univ Calif Berkeley
  • 被引频次:   7
  • DOI:   10.1002/adma.201701536
  • 出版年:   2017

▎ 摘  要

A monolayer 2D capping layer with high Young's modulus is shown to be able to effectively suppress the dewetting of underlying thin films of small organic semiconductor molecule, polymer, and polycrystalline metal, respectively. To verify the universality of this capping layer approach, the dewetting experiments are performed for single-layer graphene transferred onto polystyrene (PS), semiconducting thienoazacoronene (EH-TAC), gold, and also MoS2 on PS. Thermodynamic modeling indicates that the exceptionally high Young's modulus and surface conformity of 2D capping layers such as graphene and MoS2 substantially suppress surface fluctuations and thus dewetting. As long as the uncovered area is smaller than the fluctuation wavelength of the thin film in a dewetting process via spinodal decomposition, the dewetting should be suppressed. The 2D monolayer-capping approach opens up exciting new possibilities to enhance the thermal stability and expands the processing parameters for thin film materials without significantly altering their physical properties.