▎ 摘　　要

Graphene oxides (GOs) were reduced by H-2/Ar plasma. Changes in the atom composition and structural properties of reduced GOs (rGOs) were studied as a function of the ratio of H2 to Ar, treatment time, and discharge power by using X-ray photoelectron spectroscopy. The results suggested that the removal of oxygen-containing functional groups and the improvement of electrochemical performance were affected by the ratio of H-2 to Ar, treatment time, and discharge power. After plasma treatment, the rGO electrode showed excellent electrochemical stability and an enhanced specific capacitance of 185.2 F g1 at a scan rate of 100 mV s(-1). The present work suggests that H-2/Ar plasma treatment provides a reliable method for GO reduction, which can benefit the efficient production of graphene-based electrode materials.