• 文献标题:   Morphology and flexibility of graphene and few-layer graphene on various substrates
  • 文献类型:   Article
  • 作  者:   STOBERL U, WURSTBAUER U, WEGSCHEIDER W, WEISS D, EROMS J
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Univ Regensburg
  • 被引频次:   97
  • DOI:   10.1063/1.2968310
  • 出版年:   2008

▎ 摘  要

We report on detailed microscopy studies of graphene and few-layer graphene produced by mechanical exfoliation on various semiconducting substrates. We demonstrate the possibility to prepare and analyze graphene on (001)-GaAs, manganese p-doped (001)-GaAs, and InGaAs substrates. The morphology of graphene on these substrates was investigated by scanning electron and atomic force microscopies and compared to layers on SiO2. It was found that graphene sheets strongly follow the texture of the sustaining substrates independent on doping, polarity, or roughness. Furthermore resist residues exist on top of graphene after a lithographic step. The obtained results provide the opportunity to research the graphene-substrate interactions. (C) 2008 American Institute of Physics.