• 文献标题:   Photochemical Chlorination of Graphene
  • 文献类型:   Article
  • 作  者:   LI B, ZHOU L, WU D, PENG HL, YAN K, ZHOU Y, LIU ZF
  • 作者关键词:   graphene, covalent functionalization, photochemical chlorination, band gap opening
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851
  • 通讯作者地址:   Peking Univ
  • 被引频次:   212
  • DOI:   10.1021/nn201731t
  • 出版年:   2011

▎ 摘  要

We report the covalent functionalization of graphene by photochemical chlorination. The gas-phase photochlorination of graphene, followed by the structural transformation of the C-C bonds from sp(2) to sp(3) configuration, could remove the conducting pi-bands and open up a band gap in graphene. X-ray photoelectron spectroscopy revealed that chlorine is grafted to the basal plane of graphene, with about 8 atom % chlorine coverage. Raman spectroscopy, atomic force microscopy, and transmission electron microscopy all indicated that the photochlorinated graphene Is homogeneous and nondestructive. The resistance Increases over 4 orders of magnitude and a band gap appears upon photochlorination, confirmed by electrical measurements. Moreover, localized photochlorination of graphene can facilitate chemical patterning, which may offer a feasible approach to the realization of all-graphene circuits.