▎ 摘　　要

Of the gases frequently used during graphene chemical vapor deposition (CVD), argon plays no direct chemical role and therefore may be suitable for substitution with the cheaper alternative of nitrogen. The impact of using nitrogen as a carrier gas in methane-based hot-wall graphene CVD is investigated using Raman spectroscopy, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectroscopy. No increase in the nitrogen signal is observed within graphene grown within a nitrogen atmosphere within the detection limits of the spectroscopic techniques used.