• 文献标题:   Basal Plane Fluorination of Graphene by XeF2 via a Radical Cation Mechanism
  • 文献类型:   Article
  • 作  者:   LIU YJ, NOFFKE BW, QIAO XX, LI QQ, GAO XF, RAGHAVACHARI K, LI LS
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY LETTERS
  • ISSN:   1948-7185
  • 通讯作者地址:   Indiana Univ
  • 被引频次:   7
  • DOI:   10.1021/acs.jpclett.5b01756
  • 出版年:   2015

▎ 摘  要

Graphene fluorination with XeF2 is an attractive method to introduce a nonzero bandgap to graphene under mild conditions for potential electro-optical applications. Herein, we use well-defined graphene nanostructures as a model system to study the reaction mechanism of graphene fluorination by XeF2. Our combined experimental and theoretical studies show that the reaction can proceed through a radical cation mechanism, leading to fluorination and sp(3)-hybridized carbon in the basal plane.