• 文献标题:   One-step synthesis of chlorinated graphene by plasma enhanced chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   FAN LW, ZHANG H, ZHANG PP, SUN XH
  • 作者关键词:   graphene, chlorination, plasma, ptype
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   Soochow Univ
  • 被引频次:   15
  • DOI:   10.1016/j.apsusc.2015.04.147
  • 出版年:   2015

▎ 摘  要

We developed an approach to synthesize the chlorinated single layer graphene (CI-G) by one-step plasma enhanced chemical vapor deposition. Copper foil was simply treated with hydrochloric acid and then CuCl2 formed on the surface was used as Cl source under the assistance of plasma treatment. Compared with other two-step methods by post plasma/photochemical treatment of CVD-grown single layer graphene (SLG), one-step CI-G synthesis approach is quite straightforward and effective. X-ray photoelectron spectroscopy (XPS) revealed that similar to 2.45 atom% Cl remained in SLG. Compared with the pristine SLG, the obvious blue shifts of G band and 2D band along with the appearance of D' band and D + G band in the Raman spectra indicate p-type doping of CI-G. (C) 2015 Elsevier B.V. All rights reserved.