• 文献标题:   Performance Degradation in Graphene-ZnO Barristors Due to Graphene Edge Contact
  • 文献类型:   Article
  • 作  者:   KIM SY, RYOU J, KIM MJ, KIM K, LEE Y, KIM SM, HWANG HJ, KIM YH, LEE BH
  • 作者关键词:   graphene barristor, edge contact, fermi level pinning, graphenesemiconductor heterojunction, transistor
  • 出版物名称:   ACS APPLIED MATERIALS INTERFACES
  • ISSN:   1944-8244 EI 1944-8252
  • 通讯作者地址:   Korea Adv Inst Sci Technol KAIST
  • 被引频次:   0
  • DOI:   10.1021/acsami.0c04325
  • 出版年:   2020

▎ 摘  要

The physical and chemical characteristics of the edge states of graphene have been studied extensively as they affect the electrical properties of graphene significantly. Likewise, the edge states of graphene in contact with semiconductors or transition-metal dichalcogenides (TMDs) are expected to have a strong influence on the electrical properties of the resulting Schottky junction devices. We found that the edge states of graphene form chemical bonds with the ZnO layer, which limits the modulation of the Fermi level at the graphene-semiconductor junction, in a manner similar to Fermi level pinning in silicon devices. Therefore, we propose that graphene-based Schottky contact should be accomplished with minimal edge contact to reduce the limits imposed on the Fermi level modulation; this hypothesis has been experimentally verified, and its microscopic mechanism is further theoretically examined.