• 文献标题:   Tuning the electrical properties of graphene oxide by nitrogen ion implantation: Implication for gas sensing
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   MINITHA CR, NIVEDITA LR, ASOKAN K, KUMAR RTR
  • 作者关键词:   graphene oxide, ion implantation, reduced graphene oxide, gas sensing
  • 出版物名称:   NUCLEAR INSTRUMENTS METHODS IN PHYSICS RESEARCH SECTION BBEAM INTERACTIONS WITH MATERIALS ATOMS
  • ISSN:   0168-583X EI 1872-9584
  • 通讯作者地址:   Bharathiar Univ
  • 被引频次:   2
  • DOI:   10.1016/j.nimb.2018.12.044
  • 出版年:   2019

▎ 摘  要

Tailoring the electrical properties of graphene oxide (GO) is one of the important requirements for its application in future electronic devices. A modified Hummer's method was employed in the preparation of GO and spray coated on glass substrates, subsequently drying at 60 degrees C for 6 h. The as prepared samples were implanted with 100 keV nitrogen ions at the fluences of 1E15, 5E15 and 1E16 ions/cm(2). A peak shift to higher 28 in XRD pattern indicates the reduction of GO to rGO after N ion implantation. The intensity ratio of G and D bands (I-G/I-D) for GO derived from the Raman analysis increased from 0.97 to 1.02 after implantation (1E16 ions/cm(2)). The EDS analysis confirms the implantation of N ions in GO. The electrical conductivity improved as a function of fluence, and observed to be high for the sample of 1E16 ions/cm(2), and is tested for methanol sensing. Concentration dependent methanol sensing shows 5.9% response for 300 ppm. Above results show that ion implantation is a promising method for controlled reduction of GO for tuning the electrical properties.