• 文献标题:   Graphene Oxide as a Monoatomic Blocking Layer
  • 文献类型:   Article
  • 作  者:   PETERSEN S, GLYVRADAL M, BOGGILD P, HU WP, FEIDENHANS L R, LAURSEN BW
  • 作者关键词:   graphene oxide, molecular electronic, vertical device, barrier layer, molecular interfacing, xray reflectivity
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851
  • 通讯作者地址:   Univ Copenhagen
  • 被引频次:   15
  • DOI:   10.1021/nn302628q
  • 出版年:   2012

▎ 摘  要

Monolayer graphene oxide (mGO) is shown to effectively protect molecular thin films from reorganization and function as an atomically thin barrier for vapor-deposited Ti/Al metal top electrodes. Fragile organic Langmuir-Blodgett (LB) films of C-22 fatty acid cadmium salts (cadmium(II) behenate) were covered by a compressed mosaic LB film of mGO flakes. These hybrid LB films were examined with atomic force microscopy (AFM) and X-ray reflectivity, both with and without the metal top electrodes. While the AFM enabled surface and morphology analysis, the X-ray reflectivity allowed for a detailed structural depth profiling of the organic film and mGO layer below the metal top layers. The structure of the mGO-protected LB films was found to be perfectly preserved; in contrast, it has previously been shown that metal deposition completely destroys the first two LB layers of unprotected films. This study provides dear evidence of the efficient protection offered by a single atomic layer of GO.