• 文献标题:   Theoretical study of corundum as an ideal gate dielectric material for graphene transistors
  • 文献类型:   Article
  • 作  者:   HUANG B, XU Q, WEI SH
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Natl Renewable Energy Lab
  • 被引频次:   37
  • DOI:   10.1103/PhysRevB.84.155406
  • 出版年:   2011

▎ 摘  要

Using physical insights and advanced first-principles calculations, we suggest that corundum (alpha-Al2O3) is an ideal gate dielectric material for graphene transistors. Clean interface exists between graphene and Al-terminated (or hydroxylated) Al2O3 and the valence-band offsets for these systems are large enough to create an injection barrier. Remarkably, a band gap of similar to 180 meV can be induced in a graphene layer adsorbed on an Al-terminated surface with an electron effective mass of similar to 8 x 10(-3) me. Moreover, the band gaps of a graphene/Al2O3 system could be tuned by an external electric field for practical applications.