• 文献标题:   Interplay between nanometer-scale strain variations and externally applied strain in graphene
  • 文献类型:   Article
  • 作  者:   VERBIEST GJ, STAMPFER C, HUBER SE, ANDERSEN M, REUTER K
  • 作者关键词:  
  • 出版物名称:   PHYSICAL REVIEW B
  • ISSN:   2469-9950 EI 2469-9969
  • 通讯作者地址:   Rhein Westfal TH Aachen
  • 被引频次:   6
  • DOI:   10.1103/PhysRevB.93.195438
  • 出版年:   2016

▎ 摘  要

We present a molecular modeling study analyzing nanometer-scale strain variations in graphene as a function of externally applied tensile strain. We consider two different mechanisms that could underlie nanometer-scale strain variations: static perturbations from lattice imperfections of an underlying substrate and thermal fluctuations. For both cases we observe a decrease in the out-of-plane atomic displacements with increasing strain, which is accompanied by an increase in the in-plane displacements. Reflecting the nonlinear elastic properties of graphene, both trends together yield a nonmonotonic variation of the total displacements with increasing tensile strain. This variation allows us to test the role of nanometer-scale strain variations in limiting the carrier mobility of high-quality graphene samples.