• 文献标题:   Characterization of Graphene Grown on Bulk and Thin Film Nickel
  • 文献类型:   Article
  • 作  者:   LU CC, JIN CH, LIN YC, HUANG CR, SUENAGA K, CHIU PW
  • 作者关键词:  
  • 出版物名称:   LANGMUIR
  • ISSN:   0743-7463
  • 通讯作者地址:   Natl Tsing Hua Univ
  • 被引频次:   15
  • DOI:   10.1021/la2022038
  • 出版年:   2011

▎ 摘  要

We report on graphene films grown by atmospheric pressure chemical vapor deposition on bulk and thin film nickel. Carbon precipitation on the polycrystalline grains is controlled by the methane concentration and substrate cooling rate. It is found that graphene grows over multiple grains, with edges terminating along the grain boundaries and with dimensions directly correlated to the size of the underlying grains. This greatly restricts the resulting graphene size (<10 mu m) in the thin film growth, whereas monolayer graphene with linear dimensions of hundreds of micrometers takes up the great majority of the surface overlayers on the bulk nickel (>50%). In addition, the number of layers can be better controlled in the bulk growth. Characterizations of the graphene sheets using transmission electron microscopy, Raman spectroscopy, and transport measurements in the field-effect configuration are also discussed.