• 文献标题:   High Mobility Flexible Graphene Field-Effect Transistors with Self-Healing Gate Dielectrics
  • 文献类型:   Article
  • 作  者:   LU CC, LIN YC, YEH CH, HUANG JC, CHIU PW
  • 作者关键词:   graphene, fieldeffect transistor, selfalignment, chemical vapor deposition, flexible electronic
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Natl Tsing Hua Univ
  • 被引频次:   99
  • DOI:   10.1021/nn301199j
  • 出版年:   2012

▎ 摘  要

A high-mobility low-voltage graphene field-effect transistor (FET) array was fabricated on a flexible plastic substrate using high-capacitance natural aluminum oxide as a gate dielectric in a self-aligned device configuration. The high capacitance of the native aluminum oxide and the self-alignment, which minimizes access resistance, yield a high current on/off ratio and an operation voltage below 3 V, along with high electron and hole mobility of 230 and 300 cm(2)N . s, respectively. Moreover, the native aluminum oxide is resistant to mechanical bending and exhibits self-healing upon electrical breakdown. These results Indicate that self-aligned graphene FETs can provide remarkably improved device performance and stability for a range of applications in flexible electronics.