• 文献标题:   Measurement and characterization of interfacial mechanical properties of graphene/MoS2 heterostructure by Raman and photoluminescence (PL) spectroscopy
  • 文献类型:   Article
  • 作  者:   DU HZ, KANG YL, XU CC, XUE T, QIU W, XIE HM
  • 作者关键词:   graphene/mos2 heterostructure, raman spectroscopy, photoluminescence pl, strain, interfacial stres
  • 出版物名称:   OPTICS LASERS IN ENGINEERING
  • ISSN:   0143-8166 EI 1873-0302
  • 通讯作者地址:  
  • 被引频次:   5
  • DOI:   10.1016/j.optlaseng.2021.106825 EA SEP 2021
  • 出版年:   2022

▎ 摘  要

The mechanical and physical properties of heterostructures formed by stacking different two-dimensional materials show great potential for the next generation of electronic/optoelectronic materials. Understanding the mechanical properties in the laminated structure is extremely significant in engineering. Aimed at the performance characterization of a vertical heterostructure, a synergistic experimental measurement method for the mechanical properties of graphene (Gr)/MoS2 heterostructures is proposed. First, Raman spectroscopy and photoluminescence (PL) spectroscopy are applied to calibrate and compare the coefficients of the peak shifts to the strain in the monolayer MoS2. Then the strain-field information of MoS2 in the in-situ loading process of the substrate is measured, and the tangential interfacial stress distribution and evolution are analysed. Based on the calibration experiment, the strain fields of the two layers in the Gr/MoS2 heterostructure are measured, and the interfacial mechanical properties of the Gr-MoS2 and MoS2-substrate interface are obtained. Finally, the difference of the mechanical parameters between MoS2 and the Gr/MoS2 on a flexible substrate are compared. This work provides a reference for the design and optimization of heterostructures in device engineering applications.