• 文献标题:   Chemical Vapor Deposition of Graphene on a "Peeled-Off" Epitaxial Cu(111) Foil: A Simple Approach to Improved Properties
  • 文献类型:   Article
  • 作  者:   YU HK, BALASUBRAMANIAN K, KIM K, LEE JL, MAITI M, ROPERS C, KRIEG J, KERN K, WODTKE AM
  • 作者关键词:   chemical vapor deposition, copper catalyst, graphene, epitaxial cu 111 foil, peeloff, carrier mobility
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Univ Gottingen
  • 被引频次:   41
  • DOI:   10.1021/nn503476j
  • 出版年:   2014

▎ 摘  要

We present a simple approach to improving the quality of CVD grown graphene, exploiting a Cu(111) foil catalyst The catalyst is epitaxially grown by evaporation on a single crystal sapphire substrate, thickened by electroplating, and peeled off. The exposed surface is atomically fiat easily reduced, and exclusively of (111) orientation. Graphene grown on this catalyst under atmospheric CVD conditions and without wet chemical prereduction produces single crystal domain sizes of several hundred micrometers in samples that are many centimeters in size. The graphene produced in this way can easily be transferred to other substrates using well established techniques. We report mobilities extracted using field-effect (as high as 29 000 cm(2) V-1 s(-1)) and Hall bar measurement (up to 10 100 cm(2) V-1 s(-1)).