• 文献标题:   Low-Temperature Chemical Vapor Deposition Growth of Graphene from Toluene on Electropolished Copper Foils
  • 文献类型:   Article
  • 作  者:   ZHANG B, LEE WH, PINER R, KHOLMANOV I, WU YP, LI HF, JI HX, RUOFF RS
  • 作者关键词:   monolayer graphene, chemical vapor deposition, lowtemperature growth, electropolish, toluene
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Univ Texas Austin
  • 被引频次:   158
  • DOI:   10.1021/nn204827h
  • 出版年:   2012

▎ 摘  要

A two-step CVD route with toluene as the carbon precursor was used to grow continuous large-area monolayer graphene films on a very flat, electropolished Cu foil surface at 600 degrees C, lower than any temperature reported to date for growing continuous monolayer graphene. Graphene coverage is higher on the surface of electropolished Cu foil than that on the unelectropolished one under the same growth conditions. The measured hole and electron mobilities of the monolayer graphene grown at 600 degrees C were 811 and 190 cm(2)/(V.s), respectively, and the shift of the Dirac point was 18 V. The asymmetry in carrier mobilities can be attributed to extrinsic doping during the growth or transfer. The optical transmittance of graphene at 550 nm was 97.33%, confirming it was a monolayer, and the sheet resistance was similar to 8.02 x 10(3) Omega/square.