• 文献标题:   Graphene/Rh(111) Structure Studied Using In-Situ Scanning Tunneling Microscopy
  • 文献类型:   Article
  • 作  者:   DONG GC, BAARLE DV, FRENKEN J, TANG QW
  • 作者关键词:  
  • 出版物名称:   CHINESE PHYSICS LETTERS
  • ISSN:   0256-307X EI 1741-3540
  • 通讯作者地址:   Soochow Univ
  • 被引频次:   1
  • DOI:   10.1088/0256-307X/33/11/116101
  • 出版年:   2016

▎ 摘  要

Scanning tunnel microscopy (STM) is performed to verify if an Rh 'nails' structure is formed accompanying the graphene growing during chemical vapor deposition. A structure of a graphene island in an Rh vacancy island is used as the start. While the graphene island is removed by oxygenation, the variations of the Rh vacancy island are imaged with an in-situ high-temperature STM. By fitting with our model and calculations, we conclude that the best fit is obtained for 0% Rh, i.e., for the complete absence of nails below graphene on Rh(111). That is, when graphene is formed on Rh(111), the substrate remains flat and does not develop a supporting nail structure.