▎ 摘　　要

In this work we demonstrate for the first time the micro- and nanostructuring of graphene by means of UV-nanoimprint lithography. Exfoliated graphene on SiO2 substrates, as well as graphene deposited by chemical vapor deposition (CVD) on polycrystalline nickel and copper, and transferred CVD graphene on dielectric substrates, were used to demonstrate that our technique is suitable for large-area patterning (2 x 2 cm(2)) of graphene on various types of substrates. The demonstrated fabrication procedure of micrometer as well as nanometer-sized graphene structures with feature sizes down to 20 nm by a wafer-scale process opens up an avenue for the low-cost and high-throughput manufacturing of graphene-based optical and electronic applications. The processed graphene films show electron mobilities of up to 4.6 x 10(3) cm(2) V-1 s(-1), which confirms them to exhibit state-of-the-art electronic quality with respect to the current literature.