▎ 摘　　要

N-type doped amorphous hydrogenated silicon (a-Si: H) is deposited on top of graphene (Gr) by means of very high frequency (VHF) and radio frequency plasma-enhanced chemical vapor deposition (PECVD). In order to preserve the structural integrity of the monolayer graphene, a plasma excitation frequency of 140 MHz was successfully applied during the a-Si: H VHF-deposition. Raman spectroscopy results indicate the absence of a defect peak in the graphene spectrum after the VHF-PECVD of (n)-a-Si: H. The diode junction between (n)-a-Si: H and graphene was characterized using temperature dependent current-voltage (IV) and capacitance-voltage measurements, respectively. We demonstrate that the current at the (n)-a-Si: H-graphene interface is dominated by thermionic emission and recombination in the space charge region. The Schottky barrier height (q Phi(B)), derived by temperature dependent IV-characteristics, is about 0.49 eV. The junction properties strongly depend on the applied deposition method of (n)-a-Si: H with a clear advantage of the VHF(140 MHz)-technology. We have demonstrated that (n)-a-Si: H-graphene junctions are a promising technology approach for high frequency heterojunction transistors. Published by AIP Publishing.