• 文献标题:   Biaxial Strain in Graphene Adhered to Shallow Depressions
  • 文献类型:   Article
  • 作  者:   METZGER C, REMI S, LIU MK, KUSMINSKIY SV, NETO AHC, SWAN AK, GOLDBERG BB
  • 作者关键词:   graphene, raman spectroscopy, strain, biaxial, reflectivity
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Boston Univ
  • 被引频次:   144
  • DOI:   10.1021/nl901625v
  • 出版年:   2010

▎ 摘  要

Measurements on graphene exfoliated over a substrate prepatterned with shallow depressions demonstrate that graphene does not remain free-standing but instead adheres to the substrate despite the induced biaxial strain. The strain is homogeneous over the depression bottom as determined by Raman measurements. We find higher Raman shifts and Gruneisen parameters of the phonons underlying the G and 2D bands under biaxial strain than previously reported. Interference modeling is used to determine the vertical position of the graphene and to calculate the optimum dielectric substrate stack for maximum Raman signal.