• 文献标题:   Graphene Langmuir-Schaefer films Decorated by Pd Nanoparticles for NO2 and H-2 Gas Sensors
  • 文献类型:   Article
  • 作  者:   KOSTIUK D, LUBY S, SIFFALOVIC P, BENKOVICOVA M, IVANCO J, JERGEL M, MAJKOVA E
  • 作者关键词:   fewlayer graphene, pd nanoparticle, gas sensor, no2 h2 sensing
  • 出版物名称:   MEASUREMENT SCIENCE REVIEW
  • ISSN:   1335-8871
  • 通讯作者地址:   Slovak Acad Sci
  • 被引频次:   2
  • DOI:   10.2478/msr-2019-0011
  • 出版年:   2019

▎ 摘  要

NO2 and H-2 gas sensing by few-layer graphene (FLG) were studied in dependence on the annealing and decoration of graphene by palladium nanoparticles (NPs). Graphene was deposited onto SiO2 (500 nm)/Si substrates by a modified Langmuir-Schaefer technique. A solution of FLG flakes in 1-methyl-2-pyrrolidone was obtained by a mild sonication of the expanded milled graphite. FLG films were characterized by atomic force microscopy, X-ray diffraction, Raman spectroscopy, and the Brunnauer-Emmett-Teller method. Average FLG flake thickness and lateral dimension were 5 nm and 300 nm, respectively. Drop casting of Pd NP (6-7 nm) solution onto FLG film was applied to decorate graphene by Pd. The room temperature (RT) resistance of the samples was stabilized at 15 k Omega by vacuum annealing. Heating cycles of FLG film revealed its semiconducting character. The gas sensing was tested in the mixtures of dry air with H-2 gas (10 to 10 000 ppm) and NO2 gas (2 to 200 ppm) between RT and 200 degrees C. The response of 26 % to H-2 was achieved by FLG with Pd decoration at 70 degrees C and 10 000 ppm of H-2 in the mixture. Pure FLG film did not show any response to H-2. The response of FLG with Pd to 6 ppm of NO2 at RT was >= 23 %. It is 2 times larger than that of the pure FLG sample. Long term stability of sensors was studied.