• 文献标题:   Stenciling Graphene, Carbon Nanotubes, and Fullerenes Using Elastomeric Lift-Off Membranes
  • 文献类型:   Article
  • 作  者:   WASSEI JK, TUNG VC, JONAS SJ, CHA K, DUNN BS, YANG Y, KANER RB
  • 作者关键词:  
  • 出版物名称:   ADVANCED MATERIALS
  • ISSN:   0935-9648 EI 1521-4095
  • 通讯作者地址:   Univ Calif Los Angeles
  • 被引频次:   16
  • DOI:   10.1002/adma.200902360
  • 出版年:   2010

▎ 摘  要

Stenciling graphene, carbon nanotubes, and fullerenes, all of which are in hydrazine, can be stenciled onto substrates using a thin elastiomeric membrane composed of poly (dimethylsiloxane) (see figure). This method represents a flexible route to stencil a family of carbon nanomaterials and could be used for patterning other solvent dispersed derivatives of fullerenes, carbon nanotubes, and graphenes.